Page 140 - PCMI Journal December 2020
P. 140
Dry Film Resist Control Topics in Photo Chemical Milling Processes
Presented by: Sean Hill, Project Manager | Eternal Technology Corporation, US
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DFR Control in PC Milling Processes
PCMI Conference October 19, 2020 Sean Hill
12/18/20
DFR Control
• DFR Imaging Plays a Critical Role in Photo Chemical Milling.
• Some CM shops are more constrained in DFR control than PC shops. • Over riding priority of etch control in DES operations.
• Over all throughput in Reel-to-Reel Operations.
• Need to maintain substrate appearance.
• Harsh post develop (etch) environment.
• Priorities for DFR control:
• Photolithographic: Adhesion, Resolution, Linewidth Reproduction, Sidewall. • Post Develop Integrity: Substrate surface protection through etch.
• Understand and Achieve Optimum Performance through Preclean, Expose and Develop process control.
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Issue 136 December 2020 PCMI Journal 140
