Page 143 - PCMI Journal December 2020
P. 143
Dry Film Resist Control Topics in Photo Chemical Milling Processes Presented by: Sean Hill, Project Manager | Eternal Technology Corporation, US
12/18/20
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Exposure
Exposure
To polymerize areas of the dry film that will act as masks during subsequent etching operations.
Purpose
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Issue 136 December 2020 PCMI Journal 143
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