Page 29 - PCMI Journal December 2020
P. 29

 Manufacturing Bespoke Aesthetic and Functional Surfaces via Photochemical Machining, Electrolytic Photoetching and Electrolytic Photopolishing Presented by: David M. Allen, Emeritus Professor of Microengineering, Cranfield University, UK
Conclusions
By reviewing five applications where the etched surface finish forms an important
parameter in the part technical specification, it has been demonstrated that a wide range of surface finishes can be obtained by PCM, electrolytic photoetching and electrolytic photopolishing. In addition, it should be noted that, in all cases, the surface finish is non- directional and uniform. Table 1 shows the typical results obtained from using individual and combined PCM, electrolytic photoetching and electrolytic photopolishing techniques.
The PCM production of specific surface textures required in abrasive and tribological (bearings) applications is summarised in Table 2.
Table 1. Etch parameters for bespoke surface finishes.
   Metal / Application
     Etch process
     Resist
     Etchant
     Temp (°C)
     Etch rate
     Surface finish (Ra)
     Stainless steel / Visual contrast of microtext
    PCM
 Negative
     40°Bé ferric chloride
 50
     20-25 μm/min (by spraying)
  0.35 μm (minimum)
    Stainless steel / Gyroscope with optical beam reflection contrast
   PCM
Positive
    39°Bé ferric chloride
30
    3 μm/min
(by immersion)
≈ 2 μm
     Stainless steel / Visual contrast
      Electrolytic photoetching
   Negative
       10% (v/v) hydrochloric acid
   25
       10 μm/min at 50 Adm-2
   1.35 μm
      Stainless steel / Fluid edge filter
   Electrolytic photopolishing (followed by PCM)
 Positive (followed by negative)
   Orthophosphoric acid, glycerol, water and surfactant (followed by ferric chloride)
105
    0.7 μm/min
at 25 Adm-2 (electropolish)
≈0.065 μm
      Aluminium/ Microfluidic channels
      Electrolytic photopolishing (TMEMM)
  Positive
        Orthophosphoric acid, water and surfactant
  75
        2.6 μm/min at 1.47 V for
a cumulative charge of 10 C
  ≈0.040 μm
      Issue 136 December 2020 PCMI Journal 29















































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