Page 49 - PCMI Journal December 2020
P. 49

 General Overview of PCM Equipment - Exposure Presented by: Alexis Guilbert , Sales & Product Manager, Altix, FR
     Back to Basic | With Mask, Contact Printers
Exposure process difficulties
« Off contact » between masks & sheet Cross section
Sticky effect after exposure ?
Mechanical resistance after millions movement Proprietary and Confidential - 9
Advanced off-contact management
Vacuum Smart upper frame opening
Imaging beyond your limits
  Rigid Fully Automatic Solution Flexible Simultaneous Double Sided exposure
       Machine requirement
               Back to Basic | With Mask, Contact Printers
  Rigid Fully Automatic Solution Flexible Simultaneous Double Sided exposure
       Exposure process difficulties
Miiss--alliignmenttbettweenbotthssiides Cross section
Independent Artworks distortion due to T° and H°
                  Imaging beyond your limits
 Proprietary and Confidential - 10
 Issue 136 December 2020 PCMI Journal 49
















































































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