Page 142 - PCMI Journal December 2020
P. 142
Dry Film Resist Control Topics in Photo Chemical Milling Processes Presented by: Sean Hill, Project Manager | Eternal Technology Corporation, US 12/18/20
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Conformation Comparison Important Component of Feature Adhesion
Lower Conformation
Higher Conformation
6um score depth perpendicular to lamination direction
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PreTreatment Possibilities
• Application of Acid rinse without following water rinse to achieve slightly acid surface (typically on white metals).
• The acid surface will interact with the resist to enhance adhesion.
• Adhesion can be further enhanced by allowing the resist to remain on
the surface prior to imaging for several hours.
• This process must be controlled to avoid resist lockin or interference with subsequent develop and stripping processes.
Issue 136 December 2020 PCMI Journal 142
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