Page 50 - PCMI Journal December 2020
P. 50
General Overview of PCM Equipment - Exposure Presented by: Alexis Guilbert , Sales & Product Manager, Altix. FR
Back to Basic | With Mask, Contact Printers
Exposure process difficulties
Mis-alignment between both sides Cross section
Independent Artworks distortion due to T° and H°
Proprietary and Confidential - 11
Machine requirement
Rigid Fully Automatic Solution Flexible Simultaneous Double Sided exposure
High Accuracy Top/Bottom ±5μm
Repeatability Top/Bottom ±5μm
dY
dD
dX
Both Artworks under the same environmental conditions
Imaging beyond your limits
Back to Basic | Without Mask, Direct Imaging (DI)
RIGID/FLEX Sheet Material
FLEXIBLE Web/Coil Material
Semi – Automatic DI
Proprietary and Confidential - 12
High capabilities Quick batch change Second Image possible Operator required
Small/Medium Volume
Fully – Automatic RtR DI
DI
Fully – Automatic DI
Productivity
High capabilities Autonomous Cleanliness / Quality Easy operator access Investment
Productivity Capabilities Autonomous
All in one
XL Rigid Sheet possible Endless exposer
Auto L/UL
DI
DI
Require global RtR Process Investment
Imaging beyond your limits
Issue 136 December 2020 PCMI Journal 50
