Page 39 - PCMI Summer Journal 2021
P. 39
An Overview of the Operation of Ferric Chloride Regeneration Systems in Photochemical Etching Machines
Presented by: Kirk Lauver, the Marketing Specialist, Chemcut Corporation, US
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7/27/21
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Hydrochloric acid is the gas hydrogen chloride dissolved in water.
Heating and spraying inside an etching machine accelerates the loss of HCl
HCl must be added to make up for the losses in both batch etching without regeneration and in systems with regeneration
• Regeneration by adding chlorine gas directly to the etching solution
• Regeneration by producing chlorine within the etching solution by electrolytically decomposing hydrochloric acid
• Regeneration by producing chlorine within the etching solution by chemically decomposing hydrochloric acid
Issue 137 August 2021 PCMI Journal 39
