Page 2 - Parker - Microfiltration products

Microfi ltration Products

Engineered for Microelectronic Applications

Filter
Available Optional
Product line Ratings Typical Applications
Configurations Features
(microns)
0.03, 0.05, • Critical fi ltration of aggressive acids, bases,
FLUOROFLOW ® Cartridge 0.1, 0.2, S U XL XF strippers, and solvents
100% Fluoropolymer construction
0.45, 1.0 • Available for high temperature applications
• Encapsulated fi lter for critical fi ltration of
FLUOROCAP ® aggressive chemicals and process fl uids under
100% All-welded fl uoropolymer
Capsule 0.03, 0.05, S U XL XF harsh conditions where potential contamination
construction capsules
0.1, 0.2 during cartridge change out is a concern
• Available for high temperature applications
CHEMFLOW (PE, SELECT, & XF) 0.03, 0.05, • Filtration of UHP solvents, acids, and dilute
®
PTFE membrane | High density Cartridge 0.1, 0.2, 1.0 S XF alkaline chemistries
polyethylene structure
0.02, 0.04,
CLARIFLOW ® Cartridge
Polyethersulfone (PES) membrane | Mini-Capsule 0.1, 0.2, S • Aqueous based chemicals; recirculating etch
polypropylene structure Mini-Cartridge 0.45, 0.65, baths; UPW systems
0.8
™
PROFLOW II Cartridge 0.03, 0.05, • Ultrapure chemicals and gas processing;
PTFE membrane | Polypropylene Mini-Capsule 0.1, 0.2, S photochemical processing
structure
Mini-Cartridge 0.45, 1.0 • Bulk chemical distribution
• Acids & bases
PROFLOW -HE 0.05, 0.1, S
™
Pleated hydrophilic PTFE Cartridge 0.2, 0.5, 1.0, • Extraction/crystallization solvents
• Hot ultra-high purity deionized water
membrane | Polypropylene structure 3.0, 10.0
• Solvent fi ltration
®
POLYFLOW MEMBRANE 0.04, 0.07, S • Filtration of photochemicals & ultrapure
Polypropylene nominal rated Cartridge 0.1, 0.2 chemicals
membrane | Polypropylene structure • Gas fi ltration
POLYFLOW ® Cartridge 0.6, 1.2, 2.5, • DI water prefi ltration
Polypropylene absolute rated depth Mini-Capsule 5.0, 10.0, • Solvent and gas prefi ltration
media | Polypropylene structure Mini-Cartridge 20.0, 40.0 • General fi ltration

XF
SELECT Pleating Ultraclean XL XF
XL
S
U
The revolutionary SELECT Ultraclean is a proprietary XL technology provides maximum XF is a unique high fl ux
technology can improve process applied to electronics fl ow rate and lifetime. It combines membrane technology. It
and lower the costs of wafer grade products. It provides a SELECT technology with a larger provides superior fl ow over
processing. Imagine: up to 80% total metals extractables level diameter cartridge (3.25˝) for the traditional cartridges by utilizing
more effective fi ltration area – with of <5ppb. Ultraclean’s low level highest fl ows in the industry. an asymmetric PTFE membrane.
twice the throughput. All of this of metals extractables provides XF cartridges offer up to
with particle retention of >99.99% users with a highly consistent three times the fl ow rate and
from a cleanroom manufactured manufacturing process and very throughput at lower differential
and tested product. low product reject rates. pressure.
pressure.
SELECT Pleating

Core
Guard

Standard Pleating
Specifi cations are subject to change without notifi cation. © 2012 Parker-Hannifi n Corporation
For User Responsibility Statement, see www.parker.com/safety domnick hunter Process Filtration - North America
All Rights Reserved
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