Page 149 - PCMI Journal December 2020
P. 149
Dry Film Resist Control Topics in Photo Chemical Milling Processes Presented by: Sean Hill, Project Manager | Eternal Technology Corporation, US 12/18/20
19
RSTEP
CSTEP
Metho
9
mJ/cm2
ds30
7+
7
8
28
6
7
20
6
7
18
4
5
10
20
Step Control
• Establish step control through exposure series
• Expose step table on resolution test artwork for a series of energies: Three
Energies: Nominal, Nominal ± 40%. • Plot Energy v Step
• Use as a calibration
• Check routinely
Exposure Step Settings
Steps
mJ’s
Manual Exposure (Flood and collimated)
Automatic Exposure (Flood and collimated)
20
Issue 136 December 2020 PCMI Journal 149
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