Page 151 - PCMI Journal December 2020
P. 151
Dry Film Resist Control Topics in Photo Chemical Milling Processes Presented by: Sean Hill, Project Manager | Eternal Technology Corporation, US
12/18/20
80 70 60 50 40 30
LNE.5
RES Limited
Operating Characteristic
RES.5 ADH.5 LINE Width
OPERATING Area
ADH Limited
6 7 8 9 10 Stouffer Step
23
24
Develop Process
• To completely remove unexposed dry film and minimize developer attack on the exposed image
Issue 136 December 2020 PCMI Journal 151
12
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