Page 153 - PCMI Journal December 2020
P. 153
Dry Film Resist Control Topics in Photo Chemical Milling Processes Presented by: Sean Hill, Project Manager | Eternal Technology Corporation, US
12/18/20
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Break-point
The point in the developing chamber where bare copper becomes clearly visible
Typically recommended at ~ 50% of chamber
Developer Chamber
Break-point early – Under Cut
Issue 136 December 2020 PCMI Journal 153
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