Page 152 - PCMI Journal December 2020
P. 152
Dry Film Resist Control Topics in Photo Chemical Milling Processes Presented by: Sean Hill, Project Manager | Eternal Technology Corporation, US 12/18/20
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Developing
Developer Make up
• Water recommended to be DI, RO or <<150PPM CaCO3 equivalents to avoid scaling.
• Make up Concentration • 0.8% Na2CO3●H2O
• 1.0% K2CO3
• Temperature: 78 to 900F to optimize development as necessary.
• Note Rinse water should be 150 to 250PPM CaCO3 equivalents to ensure effective rinsing/optimum sidewalls.
Issue 136 December 2020 PCMI Journal 152
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