Page 150 - PCMI Journal December 2020
P. 150
Dry Film Resist Control Topics in Photo Chemical Milling Processes Presented by: Sean Hill, Project Manager | Eternal Technology Corporation, US
12/18/20
22
Use Exposure Series to generate Exposure Reference chart
70 60 50 40 30 20 10
EXPOSURE CHART
0
456789
Stouffer Step
21
Establish Process
• Compare step with other parameters to Establish Optimum Process: • Limiting Resolution and Feature adhesion: =LS, iso-L, iso-Pad, iso-Space
• Sidewall
• Feature size
• Post develop resist performance.
• Generate Exposure Latitude Operating Characteristic
Issue 136 December 2020 PCMI Journal 150
11
mJ/scm
