Page 57 - PCMI Journal December 2020

General Overview of PCM Equipment - Wet Processing Presented by: Mike Soble, Technical Sales Manager, Chemcut Corporation, US
11/23/20
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Four of these six steps are commonly referred to as “WET PROCESSES”. These four wet processes are:
Ø CLEAN, (remove oils and other contaminates from the surface of the metal)
Ø APPLY PHOTO-RESIST, (Coat the metal with photo sensitive material)
Ø IMAGE, (Transfer the artwork image and cure the photo-resist in areas to protected from Etching) Ø DEVELOP, (Remove the non-cured photo-resist, exposing the metal in areas to be etched)
Ø ETCH, (Chemically remove the metal from areas not protected by cured photo-resist)
Ø STRIP, (Remove the photo-resist from all surfaces leaving only the etched metal)
Chemcut
This presentation will provide an overview of the equipment necessary and typically used for each of these four WET PROCESSES.
The presentation will provide information on three levels of equipment and features:
BASIC: The minimum equipment and features necessary for each wet process
MEDIUM: The most common equipment and features used by most PCM facilities
HIGH END: Equipment and features that provides desirable, but potentially expensive features.
Chemcut
Issue 136 December 2020 PCMI Journal 57
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