Page 58 - PCMI Journal December 2020

General Overview of PCM Equipment - Wet Processing Presented by: Mike Soble, Technical Sales Manager, Chemcut Corporation, US
11/23/20
CLEAN:
The primary function of the CLEANING process is to prepare the surface of the metal to ensure proper application and adhesion of the Photo-Resist. The CLEANING process removes contaminates such as dirt and oils from the surface of the metal. For some applications, the surface is also micro-roughened to assist in the adhesion of the resist.
Two types of CLEANING processes are used. MECHANICAL Cleaning and CHEMICAL Cleaning.
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Chemcut
BASIC MECHANICAL CLEAN:
Mechanical Cleaning involves physical scrubbing of metal in a liquid environment.
The Key Parameters to proper Mechanical Cleaning are:
• The grit or abrasive quality of the scrubbing media, (scotch-brite pad)
• The pressure and speed of movement of the media on the metal
• Full coverage and uniformity of the scrubbing
• The make-up and contamination of the liquid media, (water or a mild cleaner)
Chemcut
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Issue 136 December 2020 PCMI Journal 58
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