Page 63 - PCMI Journal December 2020
P. 63
General Overview of PCM Equipment - Wet Processing Presented by: Mike Soble, Technical Sales Manager, Chemcut Corporation, US
11/23/20
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BASIC CHEMICAL CLEAN:
The Key Parameters for BASIC CHEMICAL CLEANING are:
Ø Chemistry: The make-up and concentration of the selected chemistry.
Ø Time: How long the metal remains in the bath
Ø Temperature: Changes in ambient temperature
Ø Bath Management: Dilution of chemistry and/or contaminates in the solution Ø Bath Agitation: Improving the surface exchange of chemistry by fluid movement
Chemcut
MEDIUM CHEMICAL CLEAN:
The MEDIUM or AVERAGE type of equipment used for CHEMICAL CLEANING involves transporting the product on a conveyor system. The product is loaded onto a conveyor, transported through single or multiple Chemical Cleaning Stations, is Rinsed after each Cleaning station, Dried and exits the line at the UNLOAD station.
Two Stage Chemical Clean line:
ØStation1: LOAD
Ø Station 2: CHEMICAL CLEAN #1,
• Typically an ALKALINE CLEAN ØStation3: RINSE
Ø Station 4: CHEMICAL CLEAN #2, • Typically an ACID CLEAN
ØStation5: RINSE
ØStation6: DRY
ØStation7: UNLOAD/CONVEYORDRIVE
Chemcut
Issue 136 December 2020 PCMI Journal 63
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