Page 68 - PCMI Journal December 2020

General Overview of PCM Equipment - Wet Processing Presented by: Mike Soble, Technical Sales Manager, Chemcut Corporation, US
11/23/20
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HIGH END CHEMICAL CLEAN:
The HIGH END for Chemical Cleaning equipment adds additional and/or optional features to the conveyorized spraying processing lines.
The HIGH END features include items such as:
Ø Chemical monitoring, (pH, Conductivity, SG, etc.)
Ø Dosing of fresh chemistry into Chemical Stations
Ø Spray pressure monitoring using digital pressure gauges
Ø Variable frequency pump control for automatic spray pressure control
Ø PLC controls that include ethernet connectivity for recipe driven operation and data archiving
Ø REEL to REEL processing
Ø Custom Engineering as per customer request
Chemcut
BASIC DEVELOP:
Developing the photo-resist involves washing away and chemically dissolving photo-resist that has not been cured by the imaging process leaving areas of the metal exposed for the ETCHING process. As the photo- resist has some thickness, it requires a finite period of time to dissolve the resist down to the metal surface and wash it away. It is important that the edges of the photo resist remaining on the panel be straight up and down or vertical.
It is not practical to DEVELOP in a bucket or tray!
Chemcut
Issue 136 December 2020 PCMI Journal 6183