Page 69 - PCMI Journal December 2020

General Overview of PCM Equipment - Wet Processing Presented by: Mike Soble, Technical Sales Manager, Chemcut Corporation, US
11/23/20
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BASIC DEVELOP:
To address the need for a BASIC equipment offering for DEVELOPING and other wet processes, Chemcut offers the Model 2300 series. The Model 2300 is a low cost offering that utilizes sectional construction in which a larger chamber is partitioned into smaller chambers to produce DEVELOP, RINSE, and DRYER sections. The Model 2300 series is available in 15 inch, (381 mm), 20 inch, (508 mm), and 30 inch, (762 mm) effective conveyor widths.
DEVELOP line:
ØStation1: LOAD
ØStation2: DEVELOP
Ø Station 3: RINSE 1, (Recirculated)
Ø Station 4: RINSE 2, (Fresh)
Ø Station 6: DRY, (optional) ØStation7: UNLOAD/CONVEYORDRIVE
Chemcut
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BASIC DEVELOP:
The Key Parameters for BASIC DEVELOP machines are:
Ø DWELL TIME / CONVEYOR SPEED:
• Dwell time is the amount of time the product spends in the DEVELOP Chamber. The chemical
supplier data sheet specifies a range of recommended DWELL times. These recommend Dwell times typically range from 30 to 60 seconds in a spraying chamber.
Ø TEMPERATURE CONTROL:
• Develop Stations have both heating and cooling elements. As the rate of chemical reaction increases
with temperature, it is important that the temperature be maintained at the desired set-point for consistent Developing
Ø MANUAL PRESSURE CONTROL:
• Uses valves and pressure gauges to adjust upper and lower spray pressures
Ø BATH MANAGEMENT:
• Develop systems can be operated as a batch process. Consistent chemistry replacement based on a
specified time or based on the number of panels processed is necessary to achieve consistent Developing.
• Optional FEED and BLEED systems based on pH or panel count are available and recommended
Chemcut
Issue 136 December 2020 PCMI Journal 1649