Page 160 - PCMI Journal July 2018

Johan Pellicaan | Sales Manager Central Europe & Technical Manager Dry Film Europe | MacDermid Enthone BV | NL
Dry Film Resist and Total Image
5/29/18
DIRECT IMAGING PRODUCTLINE
SL-1300 Series
DL- 3100/3200 Series
Outer MLB (TT, Plating + Metal Etching)
Inner MLB + Metal
Exposure Machine Wave length
Product name
29 micron
application
Inner MLB
UV-LDI *1 (355nm)
38 micron 47 micron
20~35
29 micron
Etching
RD- 1200/1600 Series
10 micron 15 micron 20 micron
PKG-Et + Matal 15~29 Etching 23~49
38 micron
Outer MLB (TT + Metal Etching)
PRIVILEGED AND CONFIDENTIAL MATERIALS
UV-LDI *1 (355nm)
DLP *2 (405nm)
10~20 17~35
A Platform Specialty Products Company.
Exposure Energy (mJ/cm2)
14~23
H 6600 30 micron SAP
40 micron 15~55
Series MSAP
DI FOR 4055N0 mMicrom- PHOTEC DL-3200 SERIES
Features
☆ Highest sensitivity à High through-put performance.
☆ Excellent adhesion & resolution à
☆ Very good stripping properties à
High Density, ultra fine line and space pattern formation.
Improving first pass yield. Flexibility in operation
A Platform Specialty Products Company.
☆ Tested on variousmachines
à
PRIVILEGED AND CONFIDENTIAL MATERIALS
Issue 131
July 2018 PCMI Journal 159
9