Page 162 - PCMI Journal July 2018
P. 162
Johan Pellicaan | Sales Manager Central Europe & Technical Manager Dry Film Europe | MacDermid Enthone BV | NL
Dry Film Resist and Total Image
5/29/18
What is TotalimageTM?
TotalimageTM is a system of processes that deliver superior results for photo-imaging. Designed to improve yields, increase productivity and reduce total cost of ownership, TotalimageTM is specially engineered to
support PHOTEC* / Kolon dry film
*The PHOTEC® trademark is under license from Hitachi Chemical Co.
PRIVILEGED AND CONFIDENTIAL MATERIALS
A Platform Specialty Products Company.
Why Introduce TotalimageTM
Today’s quality and high-technology capability in components manufacturing depends on a combination of both chemistry, dry film and equipment. Primary imaging and peripheral products enable densities, layout capabilities and first
pass yields.
A system of compatible and proven products—bundled with a primary imaging resist such as PHOTEC / KOLON—enables this to happen.
PRIVILEGED AND CONFIDENTIAL MATERIALS
A Platform Specialty Products Company.
Issue 131
July 2018 PCMI Journal 161
11
