Page 163 - PCMI Journal July 2018
P. 163

 Johan Pellicaan | Sales Manager Central Europe & Technical Manager Dry Film Europe | MacDermid Enthone BV | NL
Dry Film Resist and Total Image
5/29/18
  Process Sequence TotalimageTM
           Surface preparation
Lamination
  Different ENPREPTM Ti pretreatment products are available depending on equipment available and needs
Various PHOTEC and KOLON dry film types Available for several applicatiions
.
        Exposure
 PHOTEC and KOLON dry films are available for conventional Exposure techniques as well as DI (365 and 405nm)
Also LED types.
For plating refer to CUPROSTARTM and STANNOSTARTM products manuals acid and alkaline etches
PRIVILEGED AND CONFIDENTIAL MATERIALS
Development of PHOTEC and KOLON dry film
Using ENPREP Ti -1300 DS
Stripping with ENPREP Ti-1400 RS
A Platform Specialty Products Company.
    Plating/Etching
       TotalimageTM - Processes (Cleanliness)
Development
 Dry film stripping
        Surface Preparation:
–  ENPREP® Ti-1000 CL –  ENPREP Ti-1100 ME
Imaging:
–  PHOTEC / KOLON Development:
–  ENPREP Ti-1300 DS Dry film Stripping:
–  ENPREP Ti-1400 RS Equipment Maintenance /Cleaning:
– ENPREPTi-1500EC Machinecleaner PRIVILEGED AND CONFIDENTIAL MATERIALS
Cleaners acid Micro etches
Dry films
Ultra pure carbonate solution
     Amin based strippers
      A Platform Specialty Products Company.
           Issue 131
July 2018 PCMI Journal 162
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