Page 158 - PCMI Journal December 2020
P. 158
Dry Film Resist Control Topics in Photo Chemical Milling Processes Presented by: Sean Hill, Project Manager | Eternal Technology Corporation, US
12/18/20
37
DFR Post Develop Acid Resistance
• Chem milling resists are often alkaline resistant films or General Purpose films.
• This provides more protection from resist attach from harsh processing chemicals, in particular alkaline etching or strong oxidizers.
• Such films tend to be stiffer/more brittle and less flexible – flexibility a desirable characteristic of CM films.
• A possible alternative for acid etchants such as Ferric Chloride could be a less alkaline resistant film with greater flexibility and more conformance with increased adhesion potential to smooth surfaces.
Issue 136 December 2020 PCMI Journal 158
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