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專題分享:張⽂豪教授實驗室


       Large-area two-dimensional MoS2 growth and

       transfer method


                                                                                電物系 ⽑柏森 0712022
       I. Introduction

                     Low-pressure chemical vapor deposition (CVD) is used to grow a monolayer and a
              large area MoS2 at high temperatures on Aluminium oxide (Al2O3) substrate. We find that
              the shape of MoS domains is highly dependent on the spatial location on the substrate,
                               2
              with variation from a large area of film to single triangle flakes. Furthermore, under the
              same spatial conditions, the heating temperature and heating time of sulfur, MoO3
              precursor and substrate are closely related to the growth of MoS2.
              	 	    For our growing MoS2, we encountered many problems during the transfer. In our
              process,  we can grow highly aligned MoS2 flakes at good growing conditions. This is of
              great help in optical measurement, analysis, and component production, moreover, those
              great TMDs have great performance in PL and Raman measurement . But in many time,
              those 2D materials are difficult to transfer.  So we use lots of transfer methods in order to
              solve the problem of 2D material exfoliation.


       II. Experiments

             A.  MoS2 growth
              	 	    In the fabrication, the Sulfur, MoO3 and substrate are placed in the furnace tube
              separately ( Figure 1). Then use the pump to reduce the pressure in the furnace tube while
              injecting Argon gas to maintain the pressure in the tube at 30 torr. During this period, the
              Sulfur precursor is heated to 135 °C, the MoO3 precursor is heated to 730 °C; then we
              control the MoS2 growth temperature at 840°C for 10 min.














                                                    Figure 1.



              	 	    According to our experiment results, in our process, we believe that sulfur growth
              conditions play a key factor. MoO3 has better stability than Sulfur in the growing
              environment. This is because in each round of growth, we will replace MoO3, and the
              amount added each time is just enough for one round of reaction. However, we put the
              molten sulfur into a small test tube to cool, then put it into the furnace tube and heat it to
              produce S precursors. Therefore, the concentration of sulfur atoms in the environment is
              relatively unstable, and it is necessary to control the concentration by adjusting the heating
              time and temperature of sulfur.
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