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OTE/SPH
 OTE/SPH
                         3:9
          August 31, 2006
 JWBK119-25
                              Char Count= 0
        394        CUSUM and Backward CUSUM for Autocorrelated Observations
          Let δ φ represent the error in estimating the AR(1) parameter φ. Using Figure 25.3
        and given a target in-control ARL, one can see that the effect of δ φ on the appropriate
        z * is less significant for φ near 0 compared to when φ is near 1. This signifies that
        misspecification of φ would not result in a significantly different z * when the auto-
        correlation is weak. However, for a highly positively autocorrelated process, small
        misspecification of φ would result in a significantly different z * .
          Since the parabolic mask that dictates the properties of the proposed CUSUM
        scheme is characterized not only by z * but also by the autocovariance structure of the
        assumed model, it would be interesting to see the different parabolic masks for vari-
        ous values of φ that would produce a given in-control ARL. The parabolic masks that
        would provide an in-control ARL of 370 for a two-sided CUSUM scheme (or ARL 0 =
        740 for a one-sided CUSUM scheme) various values of φ are shown in Figure 25.4.
        From Figure 25.4, one can see that as φ approaches 1 the change in the angle of the arms
        of the parabola becomes faster. Thus, one can conclude that the proposed CUSUM
        scheme is less sensitive to misspecification of φ when the process is weakly positively
        autocorrelated compared to when the process is highly positively autocorrelated.
          Note that when φ is overestimated, the resulting parabola has a wider envelope than
        expected. The overestimation of φ is therefore expected to produce a CUSUM scheme



              60



              40




              20




               0
                     φ=0.00

                   =0.25
             −20         =0.50

                          =0.75

             −40
                                =0.90



             −60

        Figure 25.4 Parabolic masks for selected AR processes (φ = 0.00, 0.25, 0.50, 0.75 and 0.90);
        in-control ARL = 370.
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