Page 7 - Heroes of Chemistry Program Booklet
P. 7

ACS honors DuPont Electronics & Imaging for Chemical Mechanical Planarization
         (CMP), a key process in semiconductor fabrication, which supplies the advanced chips

         needed for smartphones, computing, the internet of things, vehicles, and numerous
         industrial applications. The CMP process, enabled by DuPont’s CMP pads, has contributed
         to the success of semiconductor technology for well over 35 years.


         William Budinger
         William (Bill) Budinger was critical to the development of the IC1000™ CMP pad family. Now retired,
         Budinger was one of the founders of Rodel, which was acquired by Rohm and Haas, became part
         of Dow, and is now the basis of the CMP business at DuPont.






         Marty DeGroot
         Marty DeGroot is R&D Director for DuPont Industrial Solutions. Marty has 15 years’ experience in
         industrial materials innovation, including the fields of catalysis, solar cells/modules, and chemical
         mechanical planarization technologies to enable advanced semiconductor nodes. He has a Ph.D. in
         Chemistry, 30 granted U.S. patents, and more than 25 publications.




         David James
         David James was a R&D Manager at Dow/Rohm and Haas. Now retired, he led a team that
         demonstrated a lower modulus polyurethane polymer for better contact and an increase in copper
         film removal rate. He also coordinated scale-up and manufacturing of the first offerings in the
         VisionPad™ pad family.




         MaryJo Kulp
         MaryJo Kulp was a Senior Scientist at Dow/Rohm and Haas. Now retired, Kulp developed and
         proved a polymeric hypothesis that resulted in the basis of the VisionPad™ CMP pad family.
         Offerings from the VisionPad™ family played a critical enabling role for the introduction of copper
         damascene integration.



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