Page 11 - Parker - Process filtration
P. 11
™
Evadur Filter Cartridges
SPECIFICATIONS
Materials of Construction Sterilization/Sanitization Methods Evadur fl ow rate vs. ΔP for
Membrane: • Isopropyl Alcohol 1 cps liquid @ 73°F (23°C)
Hydrophilic polyethersulfone • Sodium Hydroxide LPM
• Hydrogen Peroxide 0 20 40 60
Membrane Support/Drainage:
Polypropylene • Hot Water: 190°F (88°C) @ 5 psid 5
(0.3 bar)
Structural components: • Autoclave: 250°F (121°C) for 30 0.1μm .3
Polypropylene minutes at 15 psi (1.0 bar) 4
Seal Material: • In Situ Steam: 284°F (140°C) for 0.03μm 0.2μm 0.45μm
Various 60 minutes at 15 psi (1.0 bar) 3 .2
• Chlorine Differential Pressure 0.65μm
Sealing Method:
• Sodium Hypochlorite 2
Thermal welding
• Sanitizing Agents
Dimensions: (refer to most recent Compatibility .1
Diameter: 2.7 in. (6.8 cm) Guide for details) 1
Lengths: 10-40 in. (25-102 cm)
Installation Rinse-In PSI 0 BAR
Recommended Operating 0
Cartridges typically rinse to back 0 5 10 15 20
Conditions: GPM
ground resistivity in less than six Flow Rate
Maximum Temperature: 176°F (80°C)
minutes at 3.5 gpm/10" equivalent
@ 30 ΔP (2.1 bar)
Maximum Differential Pressure
Forward:
70 psi (4.8 bar) @ 77°F (25°C)
30 psi (2.1 bar) @ 176°F (80°C)
Reverse:
50 psi (3.4 bar) @ 77°F (25°C)
Ordering Information
EV B
Cartridge Code Pore Size Diameter Length Seal Material End Cap Confi guration
Code Description Code Micron Code Inches Code Inches Code Material Code Description
EV Evadur T 0.03 B 2.7 10 10 E EPR HH Double Open End
S 0.1 20 20 B Buna-N DX DOE w/extender
F 0.2 30 30 S Silicone SC 226 O-ring/Flat Cap
R 0.45 40 40 PFA Encapsulated SF 226 O-ring/Fin
T
Viton ® (O-ring only)
H 0.65 TC 222 O-ring/Flat Cap
V Viton ® (O-ring only)
TF 222 O-ring/Fin
X No seal material
LL 120 O-ring (both ends)
LR 120 O-ring/Recessed End
PR 213 O-ring/Recessed
AR 020 O-ring/Recessed
Specifi cations are subject to change without notifi cation. © 2010 Parker-Hannifi n Corporation
For User Responsibility Statement, see www.parker.com/safety domnick hunter Process Filtration - North America
All Rights Reserved
DS_IP_Evadur Rev. B
11