Page 16 - PlasmaPOD Catalog 2020
P. 16

8. Typical process applications

                         o  SiN3
                         o  SiO2

                         o  Low Temp SiO2
                         o  OxyNitride

                  9. Available Options:



               Gas lines:                           1 additional mass-flow controlled gas line (up to 3)


               Backing pump:                        Dry Rotary (recommended 35m3/Hr)
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