Page 5 - PlasmaPOD Catalog 2020
P. 5
3. Electrode Detail:
o Substrate electrode: fixed height with rotation
o Material: Stainless Steel
o Optional Cooling: internal water cooling
o Size: 160mm; cover plates for different wafer sizes can be supplied
o RF Bias available as an option
o Gas distribution: integrated gas showerhead
4. Plasma Generation Detail:
o RF generator: 300 W with Automatic match unit used for Magnetron or
Bias (Option)
DC Generator: 1 kW
5. Gas line:
o 1 gas line (inc. MFC)
o Separate vent line
6. Vacuum Arrangement:
o Process pressure measurement: capacitance manometer gauge
o Closed-loop pressure control system
o Close-coupled turbo-pump
7. Rear Services:
o Power: Single phase 110V or 230V / 50Hz rated at 16 Amps
o Water: 2 l/min connected to ¼” Swagelok fitting
o Compressed air: 80 psi
