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stops any further diffusion of charge carriers. This initial diffusion of charge
               carriers at the junction, and the development resultant barrier voltage take
               place when a p–n junction is formed during the manufacturing process. The

               barrier voltage depends upon the amount of doping, charge carriers, and the
               junction temperature. For germanium the barrier voltage is 0.3 V and for

               silicon the barrier voltage is 0.7 V at room temperature (25°C). The shaded
               portion on both sides of the p–n junction is having only immobile ions of

               opposite polarities which creates a potential difference, i.e., barrier voltage.
               This portion is devoid of any electron or hole, i.e., any charge carriers. This

               region is depleted of any charge carrier, and hence is called the depletion
               region. It may be noted that the thickness of the depletion region in Fig. 14.5
               (b) has been shown expanded. In fact, this layer is very thin, of the order of

               micrometer.
                  The p-side of the depletion region acceptor impurity atoms that have lost

               their holes associated with them by accepting electrons have become
               negatively charged ions. Similarly the n-side of the depletion region consists

               of donor atoms (pentavalent atoms) that have lost their associated free
               electrons and have become positive ions. As shown in Fig. 14.5 (b), the

               depletion layer is equally divided on both sides of the p–n junction. This is
               because both the p-type and the n-type materials have been equally doped.
               Equal percentage of doping materials have been added on both sides. If the

               doping is different, the width of the depletion region on the two sides will be
               different. Application of some voltage across the p–n junction is called

               biasing. Depending on the polarity of biasing the width of the depletion layer
               will change.



                                            14.4.4 Biasing of p–n Junction


               Biasing of a p–n junction means application of some external voltage across
               the two sides of the p–n junction. When the p-side is connected to the

               positive terminal of a battery and the n-side is connected to the negative
               terminal, the p–n junction is said to be a forward-biased junction. If the
               positive terminal of the battery is connected to the n-side and the negative
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