Page 5 - Parker - High purity chemicals in electronic application

High-Purity Chemical Application Overview Introduction

High-Purity Solvents Absorber
Column
High-purity solvents begin as general or industrial grade versions Dilution Schematic
Acid
before undergoing a series of filtration, and sometimes, distillation Storage DI Water
steps. While most think of commonly used solvents like IPA or Tank
acetone, other mostly polar solvents are used in various Distillation Distillation
microelectronics processes. Both metal ion and particle Purier Selection Process
Column
specifications will vary according to the application Hydrolyzer Sulfur Trioxide
UHP Sulfuric Acid
Vaporizer
and customer. Parker’s filters meet a wide range Sulfur Trioxide
Liquid
Storage Tank
of solvent filtration needs and enable the Absorber Isopropyl Alcohol Sulfur Trioxide Storage & Air Vent Filter Degasication
solvent manufacturer to meet the Sulfate Condensor Station
UV
Esters
needs of their customers. Sulfur Trioxide Applications
Evaporator
Reverse
Osmosis
System 2
Reverse
DI Water Ultra-Pure
Propene Osmosis
System 1
EDI Water (UPW)
Pretreatment
Tank
Sulfuric Ultapure Ion
Ultra-Pure Water Vent Filter Solvents Isopropyl
Acid Dilute HF Exchange High-Purity
Storage
Alcohol (IPA)
Tank
& Air
DI Water Oxidizer Ion High-Purity
Water Exchange
O2 Recycle Acids & Bases
Rich Air
Ultra-Pure Water Process Hydrouoric Acid
Storage Hydrogenator
Ultrapure DI Water The use of polypropylene depth filters or
Aquesous HF
Anhydrous HF Distillation Hydrogen Purication high-flow pleated filters on the deionization High-Purity
Final
Solvent
Concentrated system is used to treats incoming water and Acids & Bases
Aqueous HF Hydrouoric Acid Extractor protects the RO system. Trap filters ensure Sulfuric Acid
Liquid
that the make-up process water is
Anthraquinone
+ Solvent Hydrogen Peroxide ultra-pure by preventing downstream High-Purity
Purication Purication contamination of source water sediment Acids & Bases
Column 2 Column 1
or ion exchange bead migration. Hydrogen Peroxide
High-Purity Acids & Bases
High-purity acids & bases are critical to the cleaning and etching of microelectronic Services
devices, especially semiconductors. Parker dh’s lineup of filters are well suited for
achieving the challenging particle and ionic specifications the chemical companies need
to meet. Filtration is progressive, getting tighter throughout the process. Materials of
construction must not only be highly compatible and provide good performance, but must
also offer outstanding value. While polypropylene may be compatible in a particular acid or For detailed products in each process Selection Matrix
base for one manufacturer, it may not be suitable for another whose end user customers application, see pages 5 - 9.
require ultra low metal extractables. Parker can meet the needs of both customers.
Product Overview
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