Page 8 - Parker - High purity chemicals in electronic application

Absorber
Column
Acid
Dilution
DI Water
High-Purity Solvents Storage Introduction
Tank
Distillation
Isopropyl Alcohol (IPA) Distillation 3 4 Column
Purier
Hydrolyzer Schematic Sulfur Trioxide
UHP Sulfuric Acid
Vaporizer
Isopropyl Alcohol (IPA) is the most common Liquid
solvent used in semiconductor manufacturing. It 3 Sulfur Trioxide Storage Tank Degasication
Storage
may be used to rinse wafers in certain processes Absorber Isopropyl Alcohol Selection Process & Air Vent Filter
Sulfur Trioxide
where water contact is not desirable. IPA is also Sulfate Condensor UV
used to dry wafers and other Microelectronics Esters Sulfur Trioxide Station
devices since it will not streak or leave watermarks. Evaporator
While there are different methods of manufacturing Reverse
IPA, a common one is through the combination 2 Applications Osmosis
System 2
of propene and sulfuric acid to create sulfate 1
esters. Parker melt blown and pleated depth DI Water Ultra-Pure Reverse
filters may be used to filter these raw materials. Propene Water (UPW) Osmosis
System 1
The hydrolization process combines the sulfate High-Purity EDI
esters and Ultra-Pure Water (UPW). A hydrophilic Solvents Isopropyl Pretreatment
Tank
filter may be used to filter incoming UPW. As the Sulfuric Ultapure Alcohol (IPA) Ion
newly created IPA leaves the hydrolyzer, it may Acid Dilute HF Exchange
pass through filtration prior to other process
steps including distillation. Core Filter(s) Location Purpose Features Benefits Advantages High-Purity Ultra-Pure Water Storage
Acids & Bases
Tank
& Air
The number of distillation steps will depend on the Abso-Mate Hydrouoric Acid Vent Filter
level of purity required. Though not shown here, Poly-Mate
some manufacturers may use filters during or Incoming raw Polypropylene Capture large particles Protection of High-Purity
between distillation steps. Following distillation, Poly-Mate Plus 1 materials DI Water depth media in raw materials absorption process Acids & Bases Ion
Oxidizer
a series of filtration steps may be used to Polyflow Sulfuric Acid Water Exchange
O2
further reduce inline particle size and quantity. Rich Air Recycle
Polyflow-G High-Purity
Final package filtration is a last chance particle Clariflow-WE Acids & Bases
Storage
removal step. This is typically where inline Hydrophilic PES Removal of particles in Provide consistent Hydrogen Peroxide
Hydrogenator
source of UPW to
Ultrapure
particle counters will be used to monitor Clariflow-E 2 DI water membrane UPW down to 0.02 microns DI Water
Aquesous HF
particle size and quantity. Here, filters will be Clariflow-E Select Anhydrous HF hydrolyzer
Final
tighter than upstream filters in the manufacturing Chemflow-PE Distillation Hydrogen Solvent
Hydrouoric Acid
process. Micron rating will depend on the end Services Purication
Concentrated
user particle specification. Chemflow-PE Select 3 Pre and post PTFE membrane on Fine particle removal Protect and enhance
either HDPE or PP
Aqueous HF
Liquid
Proflow II-E distillation support structure distillation process Extractor
Proflow II-E Select Hydrogen Peroxide
Chemflow-PE Anthraquinone Selection Matrix
+ Solvent
Chemflow-PE Select PTFE membrane on Final filtration step Purication Purication
to help meet final
Proflow II-E 4 Final package either HDPE or PP Fine particle removal product particle Column 2 Column 1
support structure
Proflow II-E Select specification Product Overview
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