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InterPACK Workshop



                         Chair’s Welcome Message



                         On behalf of the Electronic and Photonics Packaging Division (EPPD) of the ASME, we have
                         the pleasure of welcoming you to the 2016 InterPACK Pathfinder Workshop at the Santa Clara
                         Marriottt, June 20-21.
                         For more than two decades, ASME’s InterPACK has established itself as a premier packaging
                         conference with strong academic and industrial support. The conference has continued to
                         distinguish itself in exploring future packaging challenges and in providing comprehensive
                         analysis and solutions for current challenges. It has evolved to become a unique meeting
                         place of tremendous technical depth, enhanced by strong industry-academia advisory
                         committees and a very popular student competition.
                         This year, the organizing committee is assessing the best directions for future growth of the
                         conference by examining the current state and future roadmaps of the industry and research
                         through an interactive workshop, where industry and academic visionary leaders will present
                         invited talks and participate in panels. The motivation for the workshop is to better explore
                         the future needs of the packaging community over the next two decades, so that the
                         InterPACK conference can effectively address these needs.

                         Working with a host of volunteers, we have assembled an impressive program with distin-
                         guished speakers from academia, industry and consortia. We have also expanded our scope
                         to adopt a broad systems focus and are partnering with the inaugural IoT Connect and the
                         25th annual Information Storage and Process Systems Program (ISPS) conferences to provide
                         a diverse vista to our participants.
                         We would like to acknowledge all the volunteers who have taken time from their busy
                         schedules and helped us recruit top speakers, and develop exciting panels where panelists
                         will share their tremendous depth of experience and future vision with audiences.  We also
                         thank the Design Materials and Manufacturing (DMM) segment of the ASME for their
                         enthusiastic support of this pathfinding forum.
                         We are very excited to be here. Over the next two days as you interact with this dynamic
                         assembly of thought leaders, we hope you will develop new connections, new perspectives
                         and new ideas that will propel our field forward. We encourage you to engage with the rest of
                         the workshop participants and look forward to hearing from you on how we can as a group
                         continue to forge new directions and continue to develop new leaders and new ideas that
                         will define our future.






                                                                                                 Ravi Mahajan
                                                                                                 Intel

                                                                                                 IPW General Chair








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