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Optical Receivers                                                                  207



                                                         Optical
                                                         input
                                       AR coating               Metal


                                                  n InP emitter
                                                  InGaAs base
                                                 n InP collector

                                                 n InP substrate


                                                    Metal

                          Figure 5.14  Schematic structure of an n–p–n InGaAs/InP phototransistor.


           charge results in electrons being injected from the emitter. The current gain mechanism is the same as in
           normal electrical operation of a BJT. The schematic structure of an n–p–n InGaAs/InP phototransistor is
           shown in Fig. 5.14.
            Heterojunction phototransistor (HPT) technology is promising, and can be built using different semicon-
           ductor structures. For example, resonant-cavity-enhanced HPTs can be developed to improve both quantum
           efficiency and responsivity. The HPT can also be integrated with a traveling wave device that is optimized for
           microwave performance [9].



           5.3.7  Avalanche Photodetectors
           APDs are the most important photodetectors with internal gain that have been widely used in fiber-optic com-
           munication systems. The APD is commonly used for detection of extremely low-intensity optical radiation
           due to its high sensitivity characteristics [10–14]. The APD can be made using Si, Ge, or III–V semiconductor
           materials. Its internal gain comes from the avalanche multiplication process through impact ionization events.
           The impact ionization phenomenon has been extensively investigated, both theoretically and experimentally
           [15–19], and a schematic representation is shown in Fig. 5.15.
            Unlike the photodetector structures discussed above, an APD operates under sufficiently high reverse volt-
           age to generate a high enough electric field in which highly energized photogenerated ehps can impact ionize.
           In more detail, under a high electric field, the high-energy conduction band electrons initially scatter with an
           electron in the valence band and knock it out into the conduction band, resulting in multiplication of the num-
           ber of electrons in the conduction band and holes in the valence band. This results in a multiplication of the
           number of current-carrying charges in this avalanche process. This avalanche process could also happen to
           high-energy valence band holes that impact ionize. To cause impact ionization, the required minimum carrier
           energy is the ionization threshold energy that should be larger than the band-gap energy.
            The process of ionization is exponentially dependent on the magnitude of the electric field. The ionization
           coefficients of electrons  and holes  are defined as the inverse of the mean distance between ionization
           collisions, but electrons and holes can lose energy in non-ionizing collision processes such as phonon scat-
           tering. One carrier undergoing the impact ionization process creates a pair of free carriers. All three carriers
           get accelerated, and then continue to undergo impact ionization events and generate more free carriers. This
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