Page 34 - february
P. 34

PROFESSIONAL ADVICE
               Let us consider typical examples of using the developed devices for processing various
        types of internal working surfaces. To apply chrome plating on the inner surface of the cylinder
        liner made of titanium alloy with a diameter of 30 mm and a length of 250 mm, cylindrical
        magnetron devices of the direct and inverted type were developed. The structural diagram of
        an integrated technological plasma device, including TsMRS-1 and InvMRS-2, is shown in Fig. 1.
        The design of the integrated device is described in detail in [1]. A tubular composite cathode is
        used in the design of the TsMRS. The cathode was made from a thin-walled non-ferromagnetic
        tube - 3 with a diameter of 0 ‘’ 314 mm with a galvanic coating of the outer surface with "milky"
        chromium with a thickness of 100-150 μm. To organize the preliminary ionic treatment of the
        inner surface, an inverted magnetron was used. Magnetic system InvMRS - 4 encompassed the
        outer surface of part - 5, which made reciprocating movements relative to the discharge area
        InvMRS - 6. The treated surface of the part served as the cathode of the InvMRS discharge.
        The anode of the magnetron discharge was a short pin 7, located on the axis of the CMRS. The
        discharge areas of the TsMRS and InvMRS were separated to exclude the interaction of their
        magnetic systems. The working gas was fed directly into the cavity of the workpiece.
                                                                               In the ion cleaning mode, the source
                                                                        of the magnetron discharge was connected
                                                                        to the  inverse  magnetron  circuit. At a
                                                                        discharge voltage of up to 700 V and an
                                                                        argon pressure of 1 - 2 Pa, the discharge
                                                                        current reached 500 mA. This corresponded
                                                                        to an ion current density on the substrate
                                                                        of 10–15 mA / cm2. This mode provided
                                                                        effective  preliminary  surface  preparation
                                                                        in a time of ≈ 5 min. Coating was carried
                                                                        out  by  switching the  discharge  source
                                                                        into the  TsMRS circuit. During  coating,
                                                                        the  workpiece  did not move  relative  to
                                                                        the  CMD.  The  magnetic system  TsMRS  -
                                                                        8  performed  a  reciprocating  movement
                                                                        in the  cathode  cavity,  the  magnetron
                                                                        discharge - 9 scanned the surface of the
        tubular cathode. The outer (chrome) surface of the tubular cathode was sprayed. The sprayed
        material was almost entirely used to form the coating. The design of the TsMRS mobile magnetic
        system provided one or several discharge arches on the cathode surface. With a double-arch
        magnetic system, an argon pressure of 1 Pa and a discharge voltage of 660 V, the discharge
        current was 2 A. The density of the ion current in the TsMRS discharge reached 0.2 A / cm2.
        The mass rate of condensation of the chromium coating was equal to the value of ion erosion of
        the surface material of the TsMRS cathode. The relative value of erosion was 0.65 mg / C, which
        corresponds to the tabular value of the ion sputtering rate of chromium, equal to 1.2 at./ion. A
        40-μm-thick coating was formed on the substrate in 150 min.


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